Sapphire Substrate: The Ultimate Foundation for High-Performance Optoelectronics
Product Overview
Sapphire Substrate is a premium single-crystal aluminum oxide (Al₂O₃) wafer engineered for cutting-edge optoelectronic and semiconductor applications. Renowned for its exceptional hardness, thermal stability, and optical transparency, it serves as the ideal substrate for high-brightness LEDs, RF ICs, laser diodes, and optical sensors.
Key Features & Benefits
✅ Unrivaled Thermal Stability
Withstand extreme temperatures (up to 2,000°C) and thermal shock – perfect for high-power devices.
✅ Superior Optical Clarity
90% light transmission across visible to near-IR spectrum, maximizing LED efficiency.
✅ Exceptional Mechanical Strength
Mohs hardness 9 (diamond=10) resists scratching and deformation during processing.
✅ Ultra-Low Electrical Conductivity
Ideal insulating properties minimize signal interference in RF/microwave circuits.
✅ Chemical Inertness
Resists acids, alkalis, and plasma etching – ensures process compatibility and longevity.
Technical Specifications
Parameter | Specification |
Material | Single Crystal Al₂O₃ (C-axis/A-axis/R-plane) |
Diameter | 2" / 4" / 6" / Custom sizes |
Thickness | 430μm / 650μm / 1,000μm ±25μm |
TTV | < 15μm (Standard), < 5μm (Premium Grade) |
Surface Finish | As-cut / Polished (Ra < 0.5nm) |
Orientation | C-plane (0001), R-plane (1-102), M-plane |
Bow/Warp | < 50μm |
EPI-Ready | Optional CMP polishing & laser marking |
Primary Applications
LED Production: GaN-based blue/green/white LEDs
Laser Diodes: VCSEL, edge-emitting lasers
RF Devices: 5G/6G antennas, power amplifiers
Optical Windows: IR sensors, camera lenses
MEMS/NEMS: Pressure sensors, micro-mirrors
